| Plasma cleaning of SEM/TEM/REM samples/holders |
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Ultra-fine plasma cleaning of samples and sample holders for electron microscopy. We have specific solutions for cleaning of TEM and REM samples and TEM sample holders with low pressure oxygen plasma. The cleaning process takes approximately 15 minutes and removes all organic elements such as grease, oil and carbon black. The sources of errors inside the REM and TEM are clearly reduced with oxygen palsma clean and the dwell time during the measurement with REM and TEM is significantly increased. The operation of the plasma system is very simple. Normally oxygen is used as process gas but for oxidation sensitive parts hydrogen can be used. Dielectric samples have to be treated with a thin conductive layer to avoid charging. This layer is normally applied with simple plasma coating using a lab sputter coater. Also for failure analysis in ceramic technology, Si3N4 samples are first plasma etched prior to analysis.
We offer free consultation, initial proof of concept treatment services and also rental units. For additional information on these services, if you have any questions, or to request a quotation, please contact us. For further detailed information please see our Introduction to Plasma Processing. |