Vacuum components, instruments and complete custom made solutions for general vacuum applications, vacuum based atomic & molecular physics and chemistry, thin film growth and UHV surface analysis.
Residual Gas Analysers
Residual Gas Analysers:

Residual gas analysers. The lowest cost and highest specification residual gas analysers currently on the market. The range includes web-enabled residual gas analysers, analytical double and triple filter quadrupole mass spectrometers, and both high pressure and differentially pumped process residual gas analysers. Standard mass range options are 100, 200 and 300amu. Analytical range options include high resolution 1-6amu for e.g. He/D2 discrimination.

Residual Gas Analysers for Vacuum Processing:

Process Residual Gas Analysers are innovative in-situ process monitoring instruments that are fully integrated and field proven application-specific packages. The range includes the latest smart head technology delivering real-time on line analysis for vacuum diagnostics and process control in etching, thin film deposition (PVD and CVD) and plasma modification processes.

Plasma Cleaning & Plasma Treatment:

Plasma treatment equipment is used to modify the surfaces of materials such as polymers, textiles, ceramics and metals. The modification takes just minutes, is environmentally friendly and does not effect the bulk material properties in any other way. Different treatments are available to produce surface properties that are either ultra-clean, highly activated (to increase bonding properties), completely liquid-repellant or totally wettable.

Benchtop Gas Analysis:

Our range of benchtop gas analysis systems comprise purpose built mass spectrometers with application specific inlets and interfaces for on-line monitoring and analysis of gases, gas mixtures, vapours and dissolved gases in liquids. They are ideal for R&D, process monitoring and control in catalysis studies, thermogravimetric analyis (TGA coupling),  membrane studies, fermentation process monitoring and thermal analysis etc.

Gas compositions can be measured over a wide dynamic range (ppt to 100%) with a wide range of sampling inlets to suit every application requirement. Versions are available with single inlet, 4, 8 or 16 way inlet.

Mass Spectrometers:

Quadrupole mass spectrometers & quadrupole mass spectrometer components. Exceptionally high performance instruments, components and systems for basic research in chemistry, physics and materials analysis.

  • high power, high resolution, high mass (up to 16,000 amu) triple-filter analysers
  • analogue and pulse ion counting
  • ion optics elements
  • combined energy filters
  • application specific ionizers (API/CI/EI/Membrane/Combined)
  • components, instruments and complete systems (for TPD/SIMS/Plasma/Molecular Beam/ MS/MS)
  • power supplies, quadrupole, octupole & hexapole ion guides and einzel lenses
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