Application specific residual gas analysers for reactive ion etch, high density etch, plasma etch and microwave etching.

The Vision 1000-E consists of “smart head” residual gas analyser technology with a closed ion source and close-coupled inlet. This state-of-art mass spectrometer technology is integrated with Process Eye control platform, a recipe based, user-configurable software program. The combination of closed ion source and automated inlet allows seamless monitoring of the complete etch process cycle, from base vacuum to process pressures of up to 500 mTorr. By maximising the ratio between Etch chamber gas signals and the gas background in the differentially pumped Vision 1000-E analyser housing, the closed ion source enables ppm-level detection for trace contaminants in the process gas.

Vision 1000-E Etch Residual Gas Analysers: Technology Etch process compatible materials throughout Heated analyser housing Unibloc inlet valve Dual filament high conductance closed ion source Process Eye Professional control platform

Simultaneous Display/Wide Dynamic Range:	Unibloc Intelligent Inlet Valve:

Related products: Langmuir probes, plasma impedance probe, ion energy analyser

Download Data Sheet:  Vision 1000E Data Sheet (296.99 kB)

We also have a simple Introduction to Mass Spectrometry that might be of interest and there are many more resources in our Links section.

For additional information on these services, if you have any questions, or to request a quotation, please contact us.