High Pressure Residual Gas Analysers

The HPQ3 and HPQ3S High Pressure Residual Gas Analysers represent the latest in pump free, high pressure process residual gas analyser technology. They are ideal for a wide range of vacuum related process monitoring applications because they operate at high pressures and do not require a support pumping package. The resulting system is less complex, with reduced installation and ongoing service requirements, offering a higher level of reliability at a substantially lower cost.

High Pressure Residual Gas Analysers - Technology:

High intrinsic sensitivity.
Gas specific high pressure algorithms.
Measure gas composition trends.
Instant alert to deviations.

Simultaneous Display/Wide Dynamic Range:	Real-Time Gas Composition Analysis:

High Pressure Residual Gas Analysers	HPQ3	HPQ3S
Mass Range	2-80 amu	2-80 amu
Detector	Faraday	Faraday
Max Operating Pressure	1 mTorr	up to 8 mTorr*
Min Detectable Concentration	5 ppm	5ppm
Stability	better than +/- 0.1 amu over 8 hours
Resolution	1 amu at 10% peak height
Bakeout Temperature	250 degree C
Mounting Flange	DN-35-CF
Ion Source	twin filament
Electron Energy	set through Process Eye 2000 recipe
Emission Current	set through Process Eye 2000 recipe
* process dependent

Download Data Sheet: icon HPQ3 Data Sheet (365.47 kB)

We also have a simple Introduction to Mass Spectrometry that might be of interest and there are many more resources in our Links section.

For additional information on our range of quadrupole mass spectrometers, if you have any questions, or to request a quotation, please contact us.