Custom, compact R&D magnetron thin film sputter desposition systems.

Our thin film magnetron sputter deposition systems represent the very latest concept in cost effective R&D or production prototyping PVD.

Under complete interlocked software control with powerful thin film sputter deposition multilayer recipe editor, they are both compact and versatile and may be configured with a range of target size options (RF, DC and pulsed DC) and with optionally integrated accessories and diagnostics including;

• ion energy analysers
• ion sources for substrate cleaning
  
• reactive sputter deposition control
• residual gas analysers
• Langmuir probes
• sputter deposition rate monitoring and control 

Sputter deposition systems can be supplied with up to 4 targets and with or without load lock chambers and linear transfer mechanisms and with multiple sample stages for with integrated sample bias and controlled heating and temperature measurement.

A unique feature of these systems is that the target mounting stage on the bottom face of the chamber is designed so that it can be effortlessly exchanged with matching stages that are configured instead with thermal, e-beam or combination sources, providing a truly multi-technique, multi-deposition system that is ideal for both small scale production and R&D prototyping.

Magnetron Sputter / Thermal Evapouration Thin Film PVD System without Load Lock

Magnetron Sputter / Thermal Evapouration Thin Film PVD System with Load Lock

Related products: PVD mass spectrometer, Langmuir probe, ion energy analyser,  quartz deposition rate monitor,

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