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Example 5: UHV System for High Tc Superconductors |
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This system is a customised multi-chamber UHV system with ARPES, dedicated for the preparation and investigation of high Tc superconductors.
UHV System for High Tc SuperconductorsThis system is a customised multi-chamber UHV system with ARPES, dedicated for the preparation and investigation of high Tc superconductors.
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UHV System DescriptionARPES System is a customised multi-chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors - University Fudan, China.
Specification Multi-chamber system designed around a central radial distribution chamber with attached analytical chamber and auxiliary chambers that fulfills the demands of a transport of samples under true UHV conditions (pressure <1E-10 mbar). The base pressure in the analytical chambers is < 5E-11 mbar.
- Multi technique analytical chamber integrates different surface analysis methods; Monochromatic UV Photoelectron Spectroscopy (UPS) and LEED.
- Sample positioning is via a stable, high precision, 5 axis manipulator with all axes motorised for automatic surface mapping.
- The sample receiving station is equipped with a closed cycle helium cryostat that allows temperature variation over the range 10K to 400K.
- The Chamber is fabricated from mu-metal and designed for energy resolution better then 0.5 meV, being equipped with a hemispherical analyser with 2D detector, monochromatic UV source and a LEED system. The flexible design allows for easy modification to meet future scientific demands.
- The system is designed so that it can be used in the laboratory as well as on a synchrotron beam line. The analyser is mounted horizontally and can be easily rotated by 90 degrees. The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER).
- Single level preparation chamber equipped with ion source and mass spectrometer and several ports which can be used in future for other preparation devices.
- Load lock chamber for loading up to six samples and internal bakeout facility.
- Sample park chamber for 6 sample holders.
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