Residual Gas Analysers

eVision2 & MicroVision2 residual gas analysers and quadrupole mass spectrometers are application specific analysers suitable for vacuum analysis & diagnostics as well as UHV/XHV science applications.

The range includes web-enabled residual gas analysers, analytical double and triple filter quadrupole mass spectrometers, and both high pressure and differentially pumped process residual gas analysers. Standard mass range options are 100, 200 and 300amu. Analytical range options include high resolution 1-6amu for e.g. He/D2 discrimination.

As standard, all instruments feature the latest in smart head technology, delivering real-time on line analysis for vacuum diagnostics and process control in general vacuum, UHV and XHV applications.


Residual Gas Analysers (RGA) for Vacuum Applications:

The new range of eVision2 residual gas analysers with web-enabled technology deliver unrivalled data acquisition speed and quality not possible with previous design residual gas analysers. Patented technology ensures millisecond data point collection even over the full dynamic measurement range and without any loss of data quality. Perfect for rapid leak detection, accurate vacuum diagnostics, chamber diagnostics and contamination monitoring, eVision2 residual gas analysers provide all the



UHV Quadrupole Mass Spectrometers:

Microvision2 UHV Quadrupole Mass Spectrometers deliver unrivalled performance in a true UHV instrument and with data collection speeds unachievable with previous generation mass spectrometers, perfect for applications such as UHV TPD.

Mcrovision2 UHV Quadrupole Mass Spectrometers are designed to collect data at millisecond speeds per data point even when measuring over the full dynamic measurement range, with better S/N characteristics than any comparable instrument due to patented detector/acquisition technology.

The instrument range includes application specific configurations such as double and triple filter quadrupoles, vacuum annealed Platinum ion source for minimum outgassing and TPD specific ion source shrouds.

High Pressure Residual Gas Analysers:

The HPQ3 and HPQ3S High Pressure Residual Gas Analysers represent the latest in pump free, high pressure process residual gas analyser technology. They are ideal for a wide range of vacuum related process monitoring applications because they operate at high pressures and do not require a support pumping package. The resulting system is less complex, with reduced installation and ongoing service requirements, offering a higher level of reliability at a substantially lower cost.


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