Vacuum Processes & UHV Surface Analysis
Vacuum processes and UHV surfae analysis are addressed with a wide range of flange mounted quadrupole mass spectrometers as well as individual options for ion sources, ion optics, ion transfer and detector types.
- analysis of residual gases to UHV pressures
- SIMS and TPD mass spectrometry
- high mass cluster measurement
- high resolution (e.g. He-D2) measurement
- fast transient processes
- bespoke system design
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