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Vacuum Processes & UHV Surface Analysis

Henniker Scientific Applications Vacuum Processes UHV Surface AnalysisVacuum processes and UHV surfae analysis are addressed with a wide range of flange mounted quadrupole mass spectrometers as well as individual options for ion sources, ion optics, ion transfer and detector types.

  • analysis of residual gases to UHV pressures
  • SIMS and TPD mass spectrometry
  • high mass cluster measurement
  • high resolution (e.g. He-D2) measurement
  • fast transient processes
  • bespoke system design

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