Substrate manipulators with RF BIAS dedicated for sputter deposition applications
Modular, motorised manipulators, suitable for a range of R1 continuous substrate rotation and Z translation (additionally can be equipped with XY movement module).
It is prepared to heat the substrate up to 1000°C with accuracy +/- 1°C. The station includes the substrate (standard up to 6-inch sample holder) positioner and allows precise angular position of the substrate in relation to linear shutter.
The 1-4 axes motorised sputtering manipulator is designed for sputter deposition applications under ultra-high vacuum conditions, and for reactive sputtering. Heating is performed by resistive method. The manipulator can work in the vertical orientation.
Manipulator for MBE applications:
- Sample holders: plate style, PTS
- Base pressure: 10-9 mbar (working pressure: ~10-2 mbar)
For more information on our UHV Transfer and Manipulators range visit our dedicated 1-4 axes Sputtering Manipulators pages.