| +44(0)1925 830 771

  • Home
  • News
  • Plasma Cleaning of Silicon Wafers

Plasma Cleaning of Silicon Wafers

  • Influence of Surface Roughness on the Dynamics and Crystallization of Vapor-Deposited Thin Films

    Surface cleanliness is often the first step in the experimental study of new materials and methods. In this recent article from the University of Silesia, the Henniker HPT-100 Plasma Cleaner is used to remove trace organic contamination from the surface of silicon wafers that are utilised in substrate roughness studies relating to the vapor deposition of Ultra-Stable Glass (USG) which has applications in the fabrication of light-emitting diodes and organic field-effect transistors.

    Hen Scientific - Electronics 
+44(0)1925 830 771