Electron Beam Evaporator
The electron beam evaporator EBV 40A1 is designed for ultra-pure sub-monolayer and multilayer thin film growth by molecular beam epitaxy.
The precisely defined evaporant beam means highly uniform deposition on the sample, the deposition area being determined by the distance from the E-beam evaporator to the sample and the choice of one of the easily exchangeable exit apertures.
The electron beam evaporator EBV 40A1 is configured with a choice of a manual or automatic shutter. Custom insertion length 190 - 345 mm (other on request)
EBV40A-PS Power Supply
A key feature of the EBV40A is the integrated flux monitor. Evaporant flux is indirectly monitored via the measured ion current, providing accurate flux adjustment and faster deposition rate control. The ion collector is contained within the beam exit column. At a given electron emission current and beam energy, the measured ion flux measured is directly proportional to the flux of evaporated atoms. The EBV40A-PS is equipped with built-in PID controller which stabilizes evaporant flux at the desired level. The unit can be operated in AUTO mode (with ion flux control) or MANUAL mode (without ion flux control). The EBV40A-PS can be supplied as a full width 19” rack mounting unit (3U height) or free standing.
The unit is also fully software controlled and web-enabled so that it can be operated over any network, including the internet.
Only one communication interface can be chosen at time of order (please refer to table) but this can be easily changed in the future via simple rear-panel plugin connection modules, without ever having to access the internals of the unit.
The EBV40A-PS power supply drives the EBV40A Electron Beam Evaporator for ultra-pure sub-monolayer and multilayer growth in MBE applications.
A full dedicated software application or library module.
- Manual or electro-pneumatic shutter, integrated PID flux monitor
- W/Th-filament for evaporation from rod material or from small conductable crucible
- Wide range of exchangeable exit apertures
- Integral water cooling
- Suitable for various materials
- Unique high reliability design
- Extremely high power densities
- Customised insertion length
- With or without integrated manual/electro-pneumatic shutter
- Linear shift