Magnetron Sputtering Source
The MS2 63C1 is a UHV compatible 2-inch Magnetron Sputtering Source providing excellent uniformity and target utilisation.
The MS2 63C1 magnetron sputtering source can be used with DC, pulsed DC, and RF power supplies and can accommodate both magnetic and non-magnetic materials, where the modular magnetic array is designed to maintain the balanced mode of operation.
The integrated in-situ tilt mechanism, which is operable from the airside, allows maximum flexibility in both standard and custom chamber geometries and the domed shutter mechanism ensures maximum use of the available space in the chamber.Options
- Mass Flow Controller Integration (with M600DC power supply)
- Z manipulator