MOKE Systems
MOKE Systems
UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.
- Base pressure range 10-10 mbar after bakeout at 150 °C
- Magnetic poles arranged perpendicularly to the sample
- Field beetwen magnetic poles > 0,17 Tesla
- 4-axes UHV sample manipulator for flag sample holders
- Sample heating up to 800 °C & cooling with LN2
- Optical system for MOKE chamber (modulator, polaryzers, photodetector, laser)
- Whole chamber with equipment is mounted on the positioning stage
- Vacuum suitcase for sample easy transport
Request a quotation or further information
Other Features
- Vacuum during deposition: ~1x10-8 mbar
- Deposition technique: Electorn beam evaporation (EB)
- Characterization technique: MOKE
- Thickness measurement: using crystal monitor
- Maximum field: ~0,3T
- Power supply: 400W
- modular design allows for connecting deposition modules (MBE, PLD, sputtering) or analysis modules (XPS, UPS, ARPES IR etc.)
